Chemical vapour deposition-new prospective possibilities

The prospects of the further development of CVD methods lie in the use of organic compounds as the source of the element that forms the surface layers in place of halides commonly used till now and in the electrical activation of the gaseous mediums containing precursors of chemical reactions guaranteed the formation of surface layers. The present state of aft of CVD processes is presented in the paper. The new direction of development especially the use of metalorganic donors and the electrical activation of chemical reaction is discussed. The paper also presents the results of formation of titanium oxicarbonitride on magnesium alloy at low temperature of 200°C. The surface Ti(N,C,O) layers have a high hardness and good wear resistance.