Rf sputtered TiO2 thin films modified by WO3.

TiO2 thin films modified by WO3 were deposited by rf sputtering from Ti-W metallic target. Tungsten content, W(Ti+W) in TiO2-WO3 thin films was varied from 0 to 0.5. Anatase polymorphic form was obtained in films with relatively high tungsten atomic ratio. The optical transmission spectra of as-sputtered and annealed samples confirmed the transformation from amorphous to polycrystalline state. High level of diffused transmission (10%) in the vicinity of the fundamental absorption edge was observed for annealed samples.