Influence of substrate type and its placement on structural properties of TiO2 thin films prepared by the high energy reactive magnetron sputtering method

The paper presents studies of the influence of substrate type and its placement on structural properties of TiO2 thin films prepared by the high energy reactive magnetron sputtering method. During the deposition, conditions of the magnetron powering have been especially selected to enhance the nucleation energy. Thin films were deposited on Si(100) and SiO2. Substrates were placed on a plate at three distances from the centre of the target. Selected substrates were also placed under various angles with respect to the plate. Thin films were examined using X-ray diffraction (XRD) and atomic force microscopy (AFM). XRD analysis showed existence of TiO2-rutile phase with preferred (110) orientation and AFM measurements revealed nanocrystalline structure of the films.