Temperature influence on copper oxides forming

The aim of this work was that starting from theoretical discussion based on use of the Purbe's [1] diagrams, investigated the possibility of electrochemical copper oxide production. Oxide types were formed by the use of galvanostatic method on plates of pure copper. The plates of pure copper were obtained in the Electrolytic refinement site in Bor. Method of oxide formation in the conditions of constant anode current density was selected for the aim of further production in the real site conditions. Process of formation oxides on copper surface was conducted into sodium sulphate electrolyte. Influence of various values of electrolyte temperature, from which the oxide was formed, was investigated. Values of anode current density were in a range from 0.1 to 20 mA/cm2, and electrolyte temperature in a range from 298 to 348 K. X-ray-diffraction analysis was used for characterization of formed oxides. It was shown out that Cu(I) oxide type is the basic type in formed oxide. The appearance of poor reflections was also observed, which were suitable to the bivalent oxide type, what has proved the formed mixed oxide on copper surface.

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Zbadano możliwość produkcji tlenku miedzi metodą elektrochemiczną. Tlenki wytwarzano stosując metodę galwanostatyczną z użyciem blach z czystej miedzi, które wyprodukowano na Wydziale Elektrolizy w Bor. Proces tworzenia tlenków miedzi przeprowadzono w elektrolicie siarczanu sodu. Badano wpływ różnych wartości temperatury w zakresie 298÷348 K oraz różnych gęstości prądowych od 0,1 do 20 mA/cm2. Metodą analizy rentgenograficznej wykazano, że podstawowym produktem był tlenek Cu(I). Obserwowano też pojawienie się refleksów tlenku Cu(II), co dowodzi, że produkowana była mieszanina tlenków miedzi na powierzchni metalu.