XPS study of air exposed copper phthalocyanine ultra-thin films deposited on Si(111) native substrates

Results are presented of XPS characterization of ultra-thin copper phthalocyanine (CuPc) (16 nm- QCM controlled) films thermally deposited under UHV conditions on p- and n- type Si(111) substrates covered by native oxide. Our attempt has been focused on comparative studies of thin films in terms of the stability and durability of CuPc layers after one year of aging in ambient atmosphere. The impact of the type of the substrate doping was also explored. Our results clearly prove that CuPc layers are chemically stable and durable after one year exposure to air. We also demonstrate the existence of the substrate doping impact on the CuPc ultra-thin film what might be caused by dipole effects.