Nanoszenie warstw metodą impulsowego rozpylania magnetronowego

Aluminium films doped with oxygen were obtained during pulsed sputtering using high-power megnetron (target of 50 mm in diameter). Surface condition of the target (magnetron mode) sputtered at various pressures of reactive gas was estimated from the change of working gas pressure during sputtering, deposition rate and parameters of the power supply. At some sputtering parameters the deposition rate and parameters of the power supply. At some sputtering parameters the deposition rate of transparent aluminium oxide films was equal to the deposition rate of aluminium films (obtained at metallic mode). So high efficiency was the result of sputtering an aluminium target, not poisoned with the reactive compound.