Data for the article entitled: "Analysis of amorphous tungsten oxide thin films deposited by magnetron sputtering for application in transparent electronics"

Files include the data presented in the manuscript entitled: "Analysis of amorphous tungsten oxide thin films deposited by magnetron sputtering for application in transparent electronics", by Mazur et al. https://doi.org/10.1016/j.apsusc.2021.151151)

Fig. 2 presents XRD patterns of tungsten oxide thin films deposited with various Ar:O2 gas ratios.

Fig. 3 presents XPS spectra of tungsten oxide thin films deposited with various Ar:O2 gas ratios: W4f and O1s core level.

Fig. 5 presents transmission spectra of tungsten oxide thin films deposited with various Ar:O2 gas ratios.

Fig. 8 presents spectra of refractive index and extinction coefficient for tungsten oxide thin films deposited with various Ar:O2 gas ratios.

Fig. 11 presents temperature dependent resistivity of tungsten oxide thin films deposited with various Ar:O2 gas ratios.

Fig. 13 presents charge decay time results of tungsten oxide thin films deposited with various Ar:O2 gas ratios.

Fig. 15a presents hardness measurements of selected tungsten oxide thin films on Ar:O2 gas ratio during magnetron sputtering process.